Quantiscript Introduces Standard Test Template for Nano-Imprint Lithography

1st Impression, a standard test pattern for Nano Imprint Lithography has been designed and will be marketed as a test template to early adopters on Nano Imprint Lithography. The imprint template is designed to help users characterize nano imprint processes

December 2, 2004 -- Quantiscript announced today the availability of if its 1stImpression nano imprint process calibration artifact. This imprint template is intended to give early adopters of nano-imprint lithography a test vehicle for assessing imprint patterning processes in order to characterize and subsequently improve process capability. It can also provide a comparative reference for assessing multiple tools or process options.

The 1stImpression template provides resolution patterns typical of those used in optical lithography including lines and trenches, posts and holes, chevrons, serpentines, as well as other structures typical of those found in semiconductor devices. Many of the included structures test for conditions that are specific to the nano imprint process. All of the structures range from 90nm down to 30nm each with varying pitches. The template is currently available from inventory on 100mm quartz substrates, or may be customized to other quartz or silicon form factors.

Quantiscript fabricates 1stImpression templates at its Sherbrooke, Quebec facility using its proprietary QSR-5 e-beam resist and associated processes.

Andrew Zanzal, Vice President of Business Development at Quantiscript commented, The 1stImpression design is the culmination of many hours of consultation with a number of tool suppliers and template users in the nano-imprint community. We are confident we have developed a comprehensive tool for lithography process evaluation.

We are hopeful the nano-imprint community will embrace 1stImpression as a standard for assessing imprint tools and processes comments Claude Brisson, President and CEO of Quantiscript, The adoption of standards by the nano-imprint community is an important aspect of making imprint a viable mainstream approach to lithography.

Parties interested in learning more about 1stImpression nano imprint process calibration artifacts can contact the company through its website at www.quantiscript.com or at the NNT 2004 conference in Vienna, Austria this week.

About Quantiscript Inc:
Quantiscript, Inc. develops and licenses resists and associated processes used in the manufacture high resolution artifacts such as mask and nano-imprint stamps for the semiconductor and other industries where nano-scale lithography is utilized. The companys initial product, QSR-5, has been proven useful in the fabrication of nano-scale structures in the sub-100nm regime.

Quantiscript Inc is a commercialization stage start-up company located in Sherbrooke, Quebec, Canada, a spin-off from the University of Sherbooke in 1999 and supported by several Canadian venture capital organizations.

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